Views:4 Author:Site Editor Publish Time: 2019-12-04 Origin:Site
A new production process for crytalline slicon (c-Si) solar cells, specifially p type back contact solar cells, is proposed.
In contrast to the conventional cSi solar cell manufacturing method, this new technology eliminates the etching process and reduces the industrial three. step electrode printing to only one step, greatly improving the technological process.
Furthermore, the proposed process is also largely compatible with a traditional cSi solar cell production line. Oxidation technology for producing the SiO2 film on a cSi wafer, together with corrosive window technology, such as through HF corrosive paste screen printing, for creating the patterning on the wafer covered with SiO, film, are used in the fabrication of the P type back contact solar cells.